| 125×125 MONO-CRYSTAL SILICON WAFER SPECIFICATION | ||
| Parameter | Value | Unit |
| Material type | CZ Mono-crystalline Silicon | |
| Geometry | Pseudo square wafer | |
| Wafer orientation | (1-0-0)±2 | Degree |
| Conductivity type | P-type | |
| Diameter | 150±0.5,165±0.5 | mm |
| Dimension | 125×125±0.5 | mm |
| Dopant | B | |
| Resistivity | 0.5-3.0 | Ω-cm |
| Oxygen content | ≤1E18 | atom/cm3 |
| Carbon content | ≤5E16 | atom/cm3 |
| Lifetime | ≥10 | µs |
| Square angle | 90±0.5 | degree |
| Thickness | 200±20 | µm |
| TTV | ≤25 | µm |
| Bow/Warp | ≤50 | µm |
| Surface | As-cut,cleaned | |
| Surface damage | Saw mark≤15 | µm |
| Surface quality | No crack,no obvious saw mark,no obvious tactility,no abnormal spot,no stain | |
| Edge defect | Depth≤0.5mm,no sharp edge | |
| 156×156 MULTI-CRYSTAL SILICON WAFER SPECIFICATION | ||
| Parameter | Value | Unit |
| Material type | Multi-crystalline Silicon/Casting | |
| Geometry | Square wafer | |
| Conductivity type | P-type | |
| Dimension | 156×156±0.5 | mm |
| Corner | 2.0±0.5 | mm |
| Dopant | B | |
| Resistivity | 0.5-3.0 | Ω-cm |
| Oxygen content | ≤8E17 | atom/cm3 |
| Carbon content | ≤9E17 | atom/cm3 |
| Lifetime | ≥2 | µs |
| Square angle | 90±0.5 | degree |
| Thickness | 200±20 | µm |
| TTV | ≤30 | µm |
| Bow/Warp | ≤75 | µm |
| Surface | As-cut,cleaned | |
| Surface damage | Saw mark≤15 | µm |
| Surface quality | No crack,no obvious saw mark,no obvious tactility,no abnormal spot,no stain | |
| Grain boundary direction | Vertical to wafer surface | |
| Edge defect | Depth≤0.5mm,no sharp edge | |